光蚀刻的伤痕的英文：
photoresist flaw
n. 光致抗蚀剂
In microelectronics, the process of removing material, on a chip, left exposed by the exposure and development of the photoresist
在微电子技术中,通过曝光并显影光刻胶除去芯片上的物质露出剩余部分的工艺。
n. 裂缝；缺点；瑕疵
v. 使破裂，（使）有缺陷
The absence of flaw in beauty is itself a flaw. ——Havelock Ellis
无缺陷的十全十美本身便是缺陷。——埃利斯
Tackling these two flaws will be painful.
解决这两个问题是很痛苦的。
A tiny flaw in a piece of white jade.
白玉微瑕。
But my perspective may have been flawed.
但是，我的看法可能是错误的。
Ingot defects may be broadly classified into internal flaws and surface flaws. Internal flaws are caused by shrinkage.
钢锭缺陷广义上可分为内部缺陷和表面缺陷。内部缺陷是因收缩引起的。